Webb9 dec. 1998 · In this paper, we report the fabrication and the device characteristics of the InP-based lattice-matched HEMTs with a 30-nm gate, which is the smallest gate yet achieved for InP-based HEMTs. A fullerene-incorporated nanocomposite resist is used in electron beam (EB) lithography to achieve such a small gate. A cutoff frequency of the … Webb1_~Ga~As~,P1_quaternary0 system match on its physical properties [6,7]. lattice-matchedto InP substrate is very important In this paper, the step cooling LPE technique in optical fiber communication applications [1]. was used to grow InGaAs thin films on InP sub-The bandgap energies correspond to the wave- strates.
The effect of lattice mismatch on the properties of InGaAs-InP ...
Webb9 dec. 1998 · In this paper, we report the fabrication and the device characteristics of the InP-based lattice-matched HEMTs with a 30-nm gate, which is the smallest gate yet … WebbJ. Davidow's 2 research works with 14 citations and 12 reads, including: Electron Density Effects in the Modulation Spectroscopy of Strained and Lattice-Matched InGaAs/InAlAs/InP HEMTs. laerdal pty limited
Investigation of InGaAs/InAlAs superlattices for quantum cascade …
Webbnearly lattice-matched to InP. x-ray diffraction measurements gave a lattice mismatch Aa/ao = -0.9.10-3 between ternary alloy and InP, corresponding to x = 0.485. We obtained the energy gap dependence on T from PR spectra. The blue shift of the gap was accounted for in terms of compositional difference with Webb1 jan. 2024 · Bandgap control for the lattice-matched InGaAs/InAlAs/InP single quantum wells. Y Wang 1,2, X Z Sheng 1, Q L Guo 2 and B L Liang 2. Published under licence … Webb1. A method of etching a Group III-V semiconductor structure lattice matched to InP comprising the steps of: (a) placing a Group III-V semiconductor structure lattice matched to InP in an etching chamber; (b) maintaining said structure within said chamber at a temperature from about 30° C. to about 150° C.; and. laerdal parts